Milenko, K.; Dullo, F.T.; Thrane, P.C.V.; Skokic, Z.; Dirdal, C.A.
UV-Nanoimprint Lithography for Predefined SERS Nanopatterns Which Are Reproducible at Low Cost and High Throughput. Nanomaterials 2023, 13, 1598.
https://doi.org/10.3390/nano13101598
AMA Style
Milenko K, Dullo FT, Thrane PCV, Skokic Z, Dirdal CA.
UV-Nanoimprint Lithography for Predefined SERS Nanopatterns Which Are Reproducible at Low Cost and High Throughput. Nanomaterials. 2023; 13(10):1598.
https://doi.org/10.3390/nano13101598
Chicago/Turabian Style
Milenko, Karolina, Firehun Tsige Dullo, Paul C. V. Thrane, Zeljko Skokic, and Christopher A. Dirdal.
2023. "UV-Nanoimprint Lithography for Predefined SERS Nanopatterns Which Are Reproducible at Low Cost and High Throughput" Nanomaterials 13, no. 10: 1598.
https://doi.org/10.3390/nano13101598
APA Style
Milenko, K., Dullo, F. T., Thrane, P. C. V., Skokic, Z., & Dirdal, C. A.
(2023). UV-Nanoimprint Lithography for Predefined SERS Nanopatterns Which Are Reproducible at Low Cost and High Throughput. Nanomaterials, 13(10), 1598.
https://doi.org/10.3390/nano13101598