Article Versions Notes

Zhang Z, Tian B, Cheng G, Liu Z, Liu J, Zhang B, Lei J, Zhao N, Han F, Fang X, et al. Influences of RF Magnetron Sputtering Power and Gas Flow Rate on a High Conductivity and Low Drift Rate of Tungsten-Rhenium Thin-Film Thermocouples. Nanomaterials. 2022; 12(7):1120. https://doi.org/10.3390/nano12071120

Zhang, Zhongkai, Bian Tian, Gong Cheng, Zhaojun Liu, Jiangjiang Liu, Bingfei Zhang, Jiaming Lei, Na Zhao, Feng Han, Xudong Fang, and et al. 2022. "Influences of RF Magnetron Sputtering Power and Gas Flow Rate on a High Conductivity and Low Drift Rate of Tungsten-Rhenium Thin-Film Thermocouples" Nanomaterials 12, no. 7: 1120. https://doi.org/10.3390/nano12071120

Zhang, Z., Tian, B., Cheng, G., Liu, Z., Liu, J., Zhang, B., Lei, J., Zhao, N., Han, F., Fang, X., Sun, H., & Zhao, L. (2022). Influences of RF Magnetron Sputtering Power and Gas Flow Rate on a High Conductivity and Low Drift Rate of Tungsten-Rhenium Thin-Film Thermocouples. Nanomaterials, 12(7), 1120. https://doi.org/10.3390/nano12071120