Article Versions Notes

Chiappim W, Neto BB, Shiotani M, Karnopp J, Gonçalves L, Chaves JP, Sobrinho AdS, Leitão JP, Fraga M, Pessoa R. Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching. Nanomaterials. 2022; 12(19):3497. https://doi.org/10.3390/nano12193497

Chiappim, William, Benedito Botan Neto, Michaela Shiotani, Júlia Karnopp, Luan Gonçalves, João Pedro Chaves, Argemiro da Silva Sobrinho, Joaquim Pratas Leitão, Mariana Fraga, and Rodrigo Pessoa. 2022. "Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching" Nanomaterials 12, no. 19: 3497. https://doi.org/10.3390/nano12193497

Chiappim, W., Neto, B. B., Shiotani, M., Karnopp, J., Gonçalves, L., Chaves, J. P., Sobrinho, A. d. S., Leitão, J. P., Fraga, M., & Pessoa, R. (2022). Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching. Nanomaterials, 12(19), 3497. https://doi.org/10.3390/nano12193497