Hernández Simón, Z.J.; Luna López, J.A.; de la Luz, A.D.H.; Pérez GarcÃa, S.A.; BenÃtez Lara, A.; GarcÃa Salgado, G.; Carrillo López, J.; Mendoza Conde, G.O.; MartÃnez Hernández, H.P.
Spectroscopic Properties of Si-nc in SiOx Films Using HFCVD. Nanomaterials 2020, 10, 1415.
https://doi.org/10.3390/nano10071415
AMA Style
Hernández Simón ZJ, Luna López JA, de la Luz ADH, Pérez GarcÃa SA, BenÃtez Lara A, GarcÃa Salgado G, Carrillo López J, Mendoza Conde GO, MartÃnez Hernández HP.
Spectroscopic Properties of Si-nc in SiOx Films Using HFCVD. Nanomaterials. 2020; 10(7):1415.
https://doi.org/10.3390/nano10071415
Chicago/Turabian Style
Hernández Simón, Zaira Jocelyn, Jose Alberto Luna López, Alvaro David Hernández de la Luz, Sergio Alfonso Pérez GarcÃa, Alfredo BenÃtez Lara, Godofredo GarcÃa Salgado, Jesus Carrillo López, Gabriel Omar Mendoza Conde, and Hayde Patricia MartÃnez Hernández.
2020. "Spectroscopic Properties of Si-nc in SiOx Films Using HFCVD" Nanomaterials 10, no. 7: 1415.
https://doi.org/10.3390/nano10071415
APA Style
Hernández Simón, Z. J., Luna López, J. A., de la Luz, A. D. H., Pérez GarcÃa, S. A., BenÃtez Lara, A., GarcÃa Salgado, G., Carrillo López, J., Mendoza Conde, G. O., & MartÃnez Hernández, H. P.
(2020). Spectroscopic Properties of Si-nc in SiOx Films Using HFCVD. Nanomaterials, 10(7), 1415.
https://doi.org/10.3390/nano10071415
