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Journal: Nanomaterials, 2020
Volume: 10
Number: 527

Article: Border Trap Characterizations of Al2O3/ZrO2 and Al2O3/HfO2 Bilayer Films Based on Ambient Post Metal Annealing and Constant Voltage Stress
Authors: by Md. Mamunur Rahman, Dae-Hyun Kim and Tae-Woo Kim
Link: https://www.mdpi.com/2079-4991/10/3/527

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