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Journal: Nanomaterials, 2020
Volume: 10
Number: 244

Article: Atomic Layer Deposition for Preparing Isolated Co Sites on SiO2 for Ethane Dehydrogenation Catalysis
Authors: by Renjing Huang, Yuan Cheng, Yichen Ji and Raymond J. Gorte
Link: https://www.mdpi.com/2079-4991/10/2/244

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