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Article

Optimization of Pt-C Deposits by Cryo-FIBID: Substantial Growth Rate Increase and Quasi-Metallic Behaviour

1
Instituto de Nanociencia y Materiales de Aragón (INMA), CSIC-Universidad de Zaragoza, 50009 Zaragoza, Spain
2
Laboratorio de Microscopías avanzadas (LMA), Universidad de Zaragoza, 50018 Zaragoza, Spain
3
Departamento de Física de la Materia Condensada, Facultad de Ciencias, Universidad de Zaragoza, 50009 Zaragoza, Spain
4
Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
5
Departamento de Química Física, Facultad de Ciencias, Universidad de Zaragoza, 50009 Zaragoza, Spain
*
Author to whom correspondence should be addressed.
Nanomaterials 2020, 10(10), 1906; https://doi.org/10.3390/nano10101906
Received: 22 August 2020 / Revised: 18 September 2020 / Accepted: 21 September 2020 / Published: 24 September 2020
(This article belongs to the Special Issue Nanopatterned Functional Materials)
The Focused Ion Beam Induced Deposition (FIBID) under cryogenic conditions (Cryo-FIBID) technique is based on obtaining a condensed layer of precursor molecules by cooling the substrate below the condensation temperature of the gaseous precursor material. This condensed layer is irradiated with ions according to a desired pattern and, subsequently, the substrate is heated above the precursor condensation temperature, revealing the deposits with the shape of the exposed pattern. In this contribution, the fast growth of Pt-C deposits by Cryo-FIBID is demonstrated. Here, we optimize various parameters of the process in order to obtain deposits with the lowest-possible electrical resistivity. Optimized ~30 nm-thick Pt-C deposits are obtained using ion irradiation area dose of 120 μC/cm2 at 30 kV. This finding represents a substantial increment in the growth rate when it is compared with deposits of the same thickness fabricated by standard FIBID at room temperature (40 times enhancement). The value of the electrical resistivity in optimized deposits (~4 × 104 µΩ cm) is suitable to perform electrical contacts to certain materials. As a proof of concept of the potential applications of this technology, a 100 µm × 100 µm pattern is carried out in only 43 s of ion exposure (area dose of 23 μC/cm2), to be compared with 2.5 h if grown by standard FIBID at room temperature. The ion trajectories and the deposit composition have been simulated using a binary-collision-approximation Monte Carlo code, providing a solid basis for the understanding of the experimental results. View Full-Text
Keywords: nanolithography; focused ion beam induced deposition; cryogenic conditions; Pt-based deposits; metal layers; semiconductor industry nanolithography; focused ion beam induced deposition; cryogenic conditions; Pt-based deposits; metal layers; semiconductor industry
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MDPI and ACS Style

Salvador-Porroche, A.; Sangiao, S.; Philipp, P.; Cea, P.; Teresa, J.M.D. Optimization of Pt-C Deposits by Cryo-FIBID: Substantial Growth Rate Increase and Quasi-Metallic Behaviour. Nanomaterials 2020, 10, 1906. https://doi.org/10.3390/nano10101906

AMA Style

Salvador-Porroche A, Sangiao S, Philipp P, Cea P, Teresa JMD. Optimization of Pt-C Deposits by Cryo-FIBID: Substantial Growth Rate Increase and Quasi-Metallic Behaviour. Nanomaterials. 2020; 10(10):1906. https://doi.org/10.3390/nano10101906

Chicago/Turabian Style

Salvador-Porroche, Alba, Soraya Sangiao, Patrick Philipp, Pilar Cea, and José M.D. Teresa 2020. "Optimization of Pt-C Deposits by Cryo-FIBID: Substantial Growth Rate Increase and Quasi-Metallic Behaviour" Nanomaterials 10, no. 10: 1906. https://doi.org/10.3390/nano10101906

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