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Journal: Information, 2023
Volume: 14
Number: 428

Article: A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography
Authors: by Aris Magklaras, Panayiotis Alefragis, Christos Gogos, Christos Valouxis and Alexios Birbas
Link: https://www.mdpi.com/2078-2489/14/8/428

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