Geng, S.; Chen, D.; Guo, Z.; Li, Q.; Wen, M.; Wang, J.; Guo, K.; Wang, J.; Wang, Y.; Yu, L.;
et al. Halloysite-Nanotube-Mediated High-Flux γ-Al2O3 Ultrafiltration Membranes for Semiconductor Wastewater Treatment. Membranes 2025, 15, 130.
https://doi.org/10.3390/membranes15050130
AMA Style
Geng S, Chen D, Guo Z, Li Q, Wen M, Wang J, Guo K, Wang J, Wang Y, Yu L,
et al. Halloysite-Nanotube-Mediated High-Flux γ-Al2O3 Ultrafiltration Membranes for Semiconductor Wastewater Treatment. Membranes. 2025; 15(5):130.
https://doi.org/10.3390/membranes15050130
Chicago/Turabian Style
Geng, Shining, Dazhi Chen, Zhenghua Guo, Qian Li, Manyu Wen, Jiahui Wang, Kaidi Guo, Jing Wang, Yu Wang, Liang Yu,
and et al. 2025. "Halloysite-Nanotube-Mediated High-Flux γ-Al2O3 Ultrafiltration Membranes for Semiconductor Wastewater Treatment" Membranes 15, no. 5: 130.
https://doi.org/10.3390/membranes15050130
APA Style
Geng, S., Chen, D., Guo, Z., Li, Q., Wen, M., Wang, J., Guo, K., Wang, J., Wang, Y., Yu, L., Li, X., & Li, X.
(2025). Halloysite-Nanotube-Mediated High-Flux γ-Al2O3 Ultrafiltration Membranes for Semiconductor Wastewater Treatment. Membranes, 15(5), 130.
https://doi.org/10.3390/membranes15050130