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Journal: Appl. Sci., 2019
Volume: 9
Number: 1275
1275
Article: Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization
Authors: by Naiyuan Sheng, Enze Li, Yiyu Sun, Tie Li, Yanqiu Li, Pengzhi Wei and Lihui Liu
Link: https://www.mdpi.com/2076-3417/9/7/1275

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