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Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

School of Materials Science and Engineering, Kumoh National Institute of Technology, Gumi, Gyeongbuk 39177, Korea
Engineering Ceramic Center, Korea Institute of Ceramic Engineering, Icheon, Gyeonggi 17303, Korea
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 34141, Korea
Author to whom correspondence should be addressed.
Appl. Sci. 2019, 9(10), 1990;
Received: 19 March 2019 / Revised: 24 April 2019 / Accepted: 30 April 2019 / Published: 15 May 2019
(This article belongs to the Special Issue Atomic Layer Deposition for the Synthesis of Thin Films)
PDF [2840 KB, uploaded 15 May 2019]


Atomic layer deposition (ALD) is a unique tool for conformally depositing inorganic thin films with precisely controlled thickness at nanoscale. Recently, ALD has been used in the manufacture of inorganic thin films using a three-dimensional (3D) nanonetwork structure made of polymer as a template, which is pre-formed by advanced 3D nanofabrication techniques such as electrospinning, block-copolymer (BCP) lithography, direct laser writing (DLW), multibeam interference lithography (MBIL), and phase-mask interference lithography (PMIL). The key technical requirement of this polymer template-assisted ALD is to perform the deposition process at a lower temperature, preserving the nanostructure of the polymer template during the deposition process. This review focuses on the successful cases of conformal deposition of inorganic thin films on 3D polymer nanonetworks using thermal ALD or plasma-enhanced ALD at temperatures below 200 °C. Recent applications and prospects of nanostructured polymer–inorganic composites or hollow inorganic materials are also discussed. View Full-Text
Keywords: atomic layer deposition; conformal deposition; low temperature; nanostructure; nanofabrication atomic layer deposition; conformal deposition; low temperature; nanostructure; nanofabrication

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Ahn, J.; Ahn, C.; Jeon, S.; Park, J. Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks. Appl. Sci. 2019, 9, 1990.

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