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Appl. Sci. 2017, 7(11), 1114;

The FLASH Facility: Advanced Options for FLASH2 and Future Perspectives

Deutsches Elektronen-Synchrotron (DESY), 22607 Hamburg, Germany
Physics Department and Center for Free-Electron Laser Science, University of Hamburg, 22761 Hamburg, Germany
Author to whom correspondence should be addressed.
Academic Editor: Kiyoshi Ueda
Received: 10 September 2017 / Revised: 13 October 2017 / Accepted: 16 October 2017 / Published: 28 October 2017
(This article belongs to the Special Issue X-Ray Free-Electron Laser)
PDF [947 KB, uploaded 28 October 2017]


Since 2016, the two free-electron laser (FEL) lines FLASH1 and FLASH2 have been run simultaneously for users at DESY in Hamburg. With the installation of variable gap undulators in the new FLASH2 FEL line, many new possibilities have opened up in terms of photon parameters for experiments. What has been tested so far is post-saturation tapering, reverse tapering, harmonic lasing, harmonic lasing self-seeding and two-color lasing. At the moment, we are working on concepts to enhance the capabilities of the FLASH facility even further. A major part of the upgrade plans, known as FLASH2020, will involve the exchange of the fixed gap undulators in FLASH1 and the implementation of a new flexible undulator scheme aimed at providing coherent radiation for multi-color experiments over a broad wavelength range. The recent achievements in FLASH2 and the current status of plans for the further development of the facility are presented. View Full-Text
Keywords: free-electron lasers; variable gap undulators; frequency doubling free-electron lasers; variable gap undulators; frequency doubling

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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Faatz, B.; Braune, M.; Hensler, O.; Honkavaara, K.; Kammering, R.; Kuhlmann, M.; Ploenjes, E.; Roensch-Schulenburg, J.; Schneidmiller, E.; Schreiber, S.; Tiedtke, K.; Tischer, M.; Treusch, R.; Vogt, M.; Wurth, W.; Yurkov, M.; Zemella, J. The FLASH Facility: Advanced Options for FLASH2 and Future Perspectives. Appl. Sci. 2017, 7, 1114.

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