Oxidation Stability of SiO2 and TiO2 Nanofluids for High Voltage Insulation
Abstract
1. Introduction
Oxidative Degradation in Natural Esters
2. Materials and Methods
2.1. Materials
2.2. Scanning Electron Microscopy of the Nanoparticles
2.3. Sample Preparation and Oxidation Stability Setup
2.4. Viscosity
2.5. Total Acid Number (TAN)
2.6. Dielectric Dissipation Factor
2.7. AC Characteristic Breakdown Voltage
3. Results and Discussion
3.1. Scanning Electron Microscopy
3.2. Nanofluid Stability
3.3. Kinematic Viscosity
3.4. Total Acid Number
3.5. Dissipation Factor
3.6. Characteristic Breakdown Voltage
4. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
References
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| Property | TiO2 | SiO2 | ||
|---|---|---|---|---|
| Average particle size | 5 nm | 10~30 nm | 5–15 nm | 10~20 nm |
| Purity % | 99.9 | 99.5 | 99.8 | 99.5 |
| Specific Surface Area m2/g | >150 | >50 | 100–140 | 160 |
| Boiling point (°C) | 2500–3000 | 2500–3000 | 2230 | 2230 |
| Melting point (°C) | 1830–1850 | 1830–1850 | 1610–1728 | 1610–1728 |
| Crystal structure | Anatase | Anatase | - | - |
| Odor | Odorless | Odorless | Odorless | Odorless |
| Color | White | White | White | White |
| Form | Powder | Powder | Powder | Powder |
| Density g/cm3 (20 °C) | 3.9 | 3.9 | 2.17–2.66 | 2.17–2.66 |
| Nanoparticles | Average Particle Size | Code Range | Loadings (wt.%) |
|---|---|---|---|
| TiO2 | (5 nm) | A1–A5 | 0.05, 0.10, 0.15, 0.20, 0.25 |
| TiO2 | (10~30 nm) | B1–B5 | 0.05, 0.10, 0.15, 0.20, 0.25 |
| SiO2 | (5–15 nm) | C1–C5 | 0.05, 0.10, 0.15, 0.20, 0.25 |
| SiO2 | (10~20 nm) | D1–D5 | 0.05, 0.10, 0.15, 0.20, 0.25 |
| Sample | N | α (kV/mm) | β | 95% Confidence Bound for α | 95% Confidence Bound for β | |
|---|---|---|---|---|---|---|
| Base sample | 6 | 57.1 | 20.92 | 57.28–63.22 | 11.38–48.01 | 0.979 |
| A1 | 6 | 58.6 | 14.74 | 58.94–67.75 | 8.03–33.83 | 0.930 |
| A2 | 6 | 63.6 | 45.46 | 63.76–66.70 | 24.77–104.37 | 0.997 |
| A3 | 6 | 67.6 | 27.86 | 67.81–73.0 | 15.18–63.95 | 0.964 |
| A4 | 6 | 72.4 | 15.89 | 72.82–82.86 | 8.66–36.47 | 0.966 |
| A5 | 6 | 67.4 | 10.52 | 68.0–81.97 | 5.99–25.23 | 0.928 |
| Sample | N | α (kV/mm) | β | 95% Confidence Bound for α | 95% Confidence Bound for β | |
|---|---|---|---|---|---|---|
| Base sample | 6 | 57.1 | 20.92 | 57.28–63.22 | 11.38–48.01 | 0.979 |
| B1 | 6 | 64.4 | 36.78 | 64.56–68.27 | 20.04–84.44 | 0.973 |
| B2 | 6 | 66.6 | 11.21 | 67.12–80.62 | 6.11–25.72 | 0.987 |
| B3 | 6 | 68.1 | 18.04 | 68.42–76.67 | 9.83–41.41 | 0.991 |
| B4 | 6 | 66.0 | 11.52 | 66.57–79.55 | 6.28–26.46 | 0.984 |
| B5 | 6 | 58.7 | 12.77 | 59.16–69.48 | 6.96–29.31 | 0.942 |
| Sample | N | α (kV/mm) | β | 95% Confidence Bound for α | 95% Confidence Bound for β | |
|---|---|---|---|---|---|---|
| Base sample | 6 | 57.1 | 20.92 | 57.28–63.22 | 11.38–48.01 | 0.979 |
| C1 | 6 | 61.8 | 30.56 | 62.0–66.30 | 16.65–70.16 | 0.925 |
| C2 | 6 | 63.3 | 17.27 | 63.68–71.72 | 9.41–39.65 | 0.946 |
| C3 | 6 | 65.8 | 23.13 | 66.11–72.24 | 12.60–53.09 | 0.987 |
| C4 | 6 | 62.3 | 24.11 | 62.55–68.11 | 13.14–55.34 | 0.986 |
| C5 | 6 | 58.9 | 24.96 | 59.10–64.17 | 13.60–57.30 | 0.982 |
| Sample | N | α (kV/mm) | β | 95% Confidence Bound for α | 95% Confidence Bound for β | |
|---|---|---|---|---|---|---|
| Base sample | 6 | 57.1 | 20.92 | 57.28–63.22 | 11.38–48.01 | 0.979 |
| D1 | 6 | 60.5 | 58.10 | 60.61–62.79 | 31.66–133.39 | 0.969 |
| D2 | 6 | 61.1 | 26.65 | 61.34–66.25 | 14.52–61.19 | 0.940 |
| D3 | 6 | 62.9 | 63.37 | 62.98–65.06 | 34.53–145.47 | 0.917 |
| D4 | 6 | 59.4 | 35.32 | 59.51–63.07 | 19.24–81.07 | 0.980 |
| D5 | 6 | 58.2 | 37.65 | 58.35–61.62 | 20.52–86.44 | 0.986 |
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Oparanti, S.O.; Brahami, Y.; Fofana, I.; Jafari, R. Oxidation Stability of SiO2 and TiO2 Nanofluids for High Voltage Insulation. Appl. Sci. 2026, 16, 1856. https://doi.org/10.3390/app16041856
Oparanti SO, Brahami Y, Fofana I, Jafari R. Oxidation Stability of SiO2 and TiO2 Nanofluids for High Voltage Insulation. Applied Sciences. 2026; 16(4):1856. https://doi.org/10.3390/app16041856
Chicago/Turabian StyleOparanti, Samson Okikiola, Youssouf Brahami, Issouf Fofana, and Reza Jafari. 2026. "Oxidation Stability of SiO2 and TiO2 Nanofluids for High Voltage Insulation" Applied Sciences 16, no. 4: 1856. https://doi.org/10.3390/app16041856
APA StyleOparanti, S. O., Brahami, Y., Fofana, I., & Jafari, R. (2026). Oxidation Stability of SiO2 and TiO2 Nanofluids for High Voltage Insulation. Applied Sciences, 16(4), 1856. https://doi.org/10.3390/app16041856

