An Exploration into Damage Repair and Manufacturing Technology of Photomask Glass Substrates
Abstract
:1. Introduction
2. Equipment
3. Mechanism of Magnetorheological Polishing Related to Subsurface Damage Removal and Mid-Frequency Ripple Error Control
3.1. CMP Subsurface Damage Model
Subsubsection
3.2. Mechanism of Magnetorheological Polishing Related to Subsurface Damage Removal
3.3. Generation and Control Mechanism of Mid-Frequency Ripple Errors in Magnetorheological Polishing
4. Damage Detection and Repair of Photomask Quartz Glass Substrates
4.1. Damage Detection of Photomask Quartz Glass Substrates
4.2. Repair and Manufacturing Process of Photomask Quartz Glass Substrates Based on Array-Type Magnetorheological Polishing Technology
5. Discussion
6. Conclusions
Author Contributions
Funding
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
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Item | Value |
---|---|
Surface shape errors | Less than 1 wave |
Surface roughness (RMS) | Less than 2 nm |
Cracks, ripples, pitting | Not allowed |
Scratches | Not allowed for sizes larger than 1 µm |
0.031/cm2 allowed for sizes less than 1 µm |
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Wang, B.; Shi, F.; Tie, G.; Song, C.; Guo, S. An Exploration into Damage Repair and Manufacturing Technology of Photomask Glass Substrates. Appl. Sci. 2022, 12, 10010. https://doi.org/10.3390/app121910010
Wang B, Shi F, Tie G, Song C, Guo S. An Exploration into Damage Repair and Manufacturing Technology of Photomask Glass Substrates. Applied Sciences. 2022; 12(19):10010. https://doi.org/10.3390/app121910010
Chicago/Turabian StyleWang, Bo, Feng Shi, Guipeng Tie, Ci Song, and Shuangpeng Guo. 2022. "An Exploration into Damage Repair and Manufacturing Technology of Photomask Glass Substrates" Applied Sciences 12, no. 19: 10010. https://doi.org/10.3390/app121910010
APA StyleWang, B., Shi, F., Tie, G., Song, C., & Guo, S. (2022). An Exploration into Damage Repair and Manufacturing Technology of Photomask Glass Substrates. Applied Sciences, 12(19), 10010. https://doi.org/10.3390/app121910010