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A Miniaturized and Fast System for Thin Film Thickness Measurement

State Key Laboratory of Precision Measuring Technology & Instruments, Centre of MicroNano Manufacturing Technology, Tianjin University, Tianjin 300072, China
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Appl. Sci. 2020, 10(20), 7284; https://doi.org/10.3390/app10207284
Received: 25 August 2020 / Revised: 13 October 2020 / Accepted: 15 October 2020 / Published: 18 October 2020
(This article belongs to the Section Applied Physics)
Transparent films are significant industrial components that are widely used in modern optics, microelectronics, optical engineering, and other related fields. There is an urgent need for the fast and stable thickness measurement of industrial films at the micron-grade. This paper built a miniaturized and low-cost film thickness measurement system based on confocal spectral imaging and the principle of thin-film spectral interference. The reflection interference spectrum was analyzed to extract the phase term introduced by the film thickness from the full spectrum information, where local spectral noise can be better corrected. An efficient and robust film thickness calculation algorithm was realized without any calibrating sample. The micron-grade thickness measurement system had an industrial property with a measurement range of up to 75 μm with a measurement uncertainty of 0.1 μm, presenting a good performance in single-layer film thickness measurement with high efficiency. View Full-Text
Keywords: thin-film interference thickness measurement; reflection interference spectrum; non-uniform Fourier transform thin-film interference thickness measurement; reflection interference spectrum; non-uniform Fourier transform
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MDPI and ACS Style

Hao, R.; Zhu, L.; Li, Z.; Fang, F.; Zhang, X. A Miniaturized and Fast System for Thin Film Thickness Measurement. Appl. Sci. 2020, 10, 7284.

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