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Advanced AlGaAs/GaAs Heterostructures Grown by MOVPE

Sigm Plus Co., 3 Vvedenskogo str., Moscow 117342, Russia
Lebedev Physical Institute, Russian Academy of Sciences, 53 Leninskii prosp., Moscow 119991, Russia
Author to whom correspondence should be addressed.
Crystals 2019, 9(6), 305;
Received: 21 April 2019 / Revised: 24 May 2019 / Accepted: 29 May 2019 / Published: 14 June 2019
(This article belongs to the Special Issue MOVPE Growth of Crystalline Film)
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AlGaAs/GaAs heterostructures are the base of many semiconductor devices. The fabrication of new types of devices demands heterostructures with special features, such as large total thickness (~20 μm), ultrathin layers (~1 nm), high repeatability (up to 1000 periods) and uniformity, for which a conventional approach of growing such heterostructures is insufficient and the development of new growth procedures is needed. This article summarizes our work on the metalorganic vapour-phase epitaxy (MOVPE) growth of AlGaAs/GaAs heterostructures for modern infrared devices. The growth approaches presented allow for the improved output characteristics of different emitting devices such as multi active region lasers, epitaxially integrated via highly doped tunnel junctions (emission wavelength λ ~ 1 μm), quantum cascade lasers (λ ~10 μm) and THz laser (λ ~100 μm), based on short-period superlattice with 500–2000 layers. View Full-Text
Keywords: MOVPE; AlGaAs/GaAs; epitaxial integration; mechanical stress; superlattice; quantum cascade laser MOVPE; AlGaAs/GaAs; epitaxial integration; mechanical stress; superlattice; quantum cascade laser

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Ladugin, M.A.; Yarotskaya, I.V.; Bagaev, T.A.; Telegin, K.Y.; Andreev, A.Y.; Zasavitskii, I.I.; Padalitsa, A.A.; Marmalyuk, A.A. Advanced AlGaAs/GaAs Heterostructures Grown by MOVPE. Crystals 2019, 9, 305.

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