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Journal: Crystals, 2025
Volume: 15
Number: 477

Article: Numerical Simulation of the Effect of APCVD Reactor Tilted Ceiling Height on Silicon Epitaxial Layer Thickness Uniformity
Authors: by Ba-Phuoc Le, Jyh-Chen Chen, Chieh Hu, Wei-Jie Lin, Chun-Chin Tu and Liang-Chin Chen
Link: https://www.mdpi.com/2073-4352/15/5/477

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