Nalawade, S.; Vondee, E.; Liu, M.; Chris-Okoro, I.; Cherono, S.; Kumar, D.; Aravamudhan, S.
Role of Oxygen Concentration in Reactive Sputtering of RuO2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance. Crystals 2025, 15, 417.
https://doi.org/10.3390/cryst15050417
AMA Style
Nalawade S, Vondee E, Liu M, Chris-Okoro I, Cherono S, Kumar D, Aravamudhan S.
Role of Oxygen Concentration in Reactive Sputtering of RuO2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance. Crystals. 2025; 15(5):417.
https://doi.org/10.3390/cryst15050417
Chicago/Turabian Style
Nalawade, Swapnil, Ebenezer Vondee, Mengxin Liu, Ikenna Chris-Okoro, Sheilah Cherono, Dhananjay Kumar, and Shyam Aravamudhan.
2025. "Role of Oxygen Concentration in Reactive Sputtering of RuO2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance" Crystals 15, no. 5: 417.
https://doi.org/10.3390/cryst15050417
APA Style
Nalawade, S., Vondee, E., Liu, M., Chris-Okoro, I., Cherono, S., Kumar, D., & Aravamudhan, S.
(2025). Role of Oxygen Concentration in Reactive Sputtering of RuO2 Thin Films: Tuning Surface Chemistry for Enhanced Electrocatalytic Performance. Crystals, 15(5), 417.
https://doi.org/10.3390/cryst15050417