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Journal: Crystals, 2025
Volume: 15
Number: 2

Article: Effect of Process Pressure on the Properties of Cu2O Thin Films Deposited by RF Magnetron Sputtering
Authors: by Junghwan Park, Chang-Sik Son, Young-Guk Son and Donghyun Hwang
Link: https://www.mdpi.com/2073-4352/15/1/2

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