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Journal: Crystals, 2023
Volume: 13
Number: 869
Article:
Influences of Nonaqueous Slurry Components on Polishing 4H-SiC Substrate with a Fixed Abrasive Pad
Authors:
by
Jiyuan Zhong, Jiapeng Chen, Hanqiang Wang, Haibo Chen, Yunyun Gu, Juanfen Shen and Tao Sun
Link:
https://www.mdpi.com/2073-4352/13/6/869
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