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Journal: Crystals, 2023
Volume: 13
Number: 869

Article: Influences of Nonaqueous Slurry Components on Polishing 4H-SiC Substrate with a Fixed Abrasive Pad
Authors: by Jiyuan Zhong, Jiapeng Chen, Hanqiang Wang, Haibo Chen, Yunyun Gu, Juanfen Shen and Tao Sun
Link: https://www.mdpi.com/2073-4352/13/6/869

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