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Journal: CrystalsVolume: 13Number: 301
Article: Influence of Rapid Thermal Annealing on the Characteristics of Sn-Doped Ga2O3 Films Fabricated Using Plasma-Enhanced Atomic Layer Deposition
- Authors:
- Yi Shen1,2,
- Hong-Ping Ma1,2,3,* and
- Zhen-Yu Wang1,2
- et al.
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