Two-Temperature Semiconductor Model Photomechanical and Thermal Wave Responses with Moisture Diffusivity Process
Abstract
1. Introduction
2. Basic Equations
3. Formulation of the Problem
4. Harmonic Wave Analysis
5. Applications
6. Numerical Results and Discussions
6.1. The Effect of Two-Temperature Parameter
6.2. The Impact of Thermoelastic Coupling Parameter
) represent the case when , the dashed lines (
) express the case at , and the dotted lines (
) show the case at . The thermodynamic temperature distribution () is shown in the first subfigure along with how the distance affects the dimensionless thermoelastic coupling parameters. Starting from a positive minimum temperature that satisfies the thermally insulated requirement, the thermodynamic temperature rises rapidly in the first range until it reaches the maximum peak temperature close to the surface due to photo-excitation and moisture diffusivity. The distribution, on the other hand, shrinks in the second range to arrive at the minimum value distant from the surface. The electronic diffusive distribution is shown against the distance in variation values of the thermoelastic parameters in the second subfigure. However, the carrier density, which exhibits a similar quality characteristic, is not significantly affected by a slight change in the thermoelastic coupling parameters. The fourth subfigure describes the moisture concentration distribution versus the horizontal distance , while the third subfigure depicts the conductive temperature, which exhibits the same behavior as the first subfigure. For all three cases, the distribution of moisture content starts at zero. The distribution adopts an exponential pattern with smooth decrementing with . On the other hand, due to moisture diffusivity, when and the distribution of moisture concentration dramatically declines in the first range, and it adopts exponential propagation behavior until it reaches a minimum value close to the zero line. The fifth subfigure shows how the amplitude of the stress force is increasing as a result of the mechanical loads’ tendency to raise the thermoelastic coupling parameters’ values. The displacement distribution with horizontal distance caused by moisture diffusivity and the thermal impact of photothermal stimulation for the rough surface is shown in the sixth subfigure. For all three thermoelastic coupling parameter scenarios, the displacement distribution begins at zero and climbs to maximum values close to the surface before decreasing exponentially until it approaches a minimum value close to the zero line [41]. These results are in agreement with what has been observed through practical experiments [42,43].6.3. The Effect of the Thermoelectric Coupling Parameter
) represent the case when , the dashed lines (
) express the case at , and the dotted lines (
) show the case at . The thermo-dynamical temperature distribution with variation in the dimensionless thermoelectric coupling parameters with distance is shown in the first subfigure. Starting at a positive minimum value that satisfies the thermally insulated requirement, the thermodynamic temperature rises quickly in the first range until it reaches the peak maximum value close to the surface because of photo-excitation and moisture diffusivity. The distribution, on the other hand, contracts in the second range to approach the minimum value far from the surface. The carrier density distribution is shown against the distance in variation values of the thermoelastic parameters in the second subfigure. However, the carrier density, which exhibits a similar quality characteristic, is not significantly affected by a slight change in the thermoelastic coupling parameters. The conductive temperature, which behaves similarly to the dynamical temperature, is depicted in the third subfigure. The distribution of moisture concentration against horizontal distance is shown in the fourth subfigure. For each of the three scenarios, the moisture concentration distribution starts from a positive value for all three cases. In the case of , the distribution takes the exponential behavior with smooth decreasing. Still, on the other hand, when and , the distribution of moisture concentration decreases sharply near the surface, and it takes an exponential propagation behavior until it reaches a minimum value near the zero line due to moisture diffusivity. The fifth subfigure shows how the mechanical loads that tend to raise the value of the thermoelectric coupling parameters enhance the stress force amplitude. The displacement distribution with horizontal distance caused by moisture diffusivity and the thermal impact of photothermal stimulation for the rough surface is shown in the sixth subfigure. For each of the three thermoelectric coupling parameter situations, the displacement distribution begins at zero, climbs to maximum values near the surface, and then decreases in an exponential propagation pattern until it reaches a minimum value close to the zero line.6.4. Influence of Reference Moisture
), the second case of reference moisture field when (
), and the third case of reference moisture field when (
). All evaluations are made in the moisture field when and . From this figure, it is clear that the moisture field affects the wave propagation behavior of displacement, moisture concentration, stress force, temperature distributions, and carrier density distribution, but carrier density does not affect it. 6.5. The Comparison between Si and Ge Materials
7. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
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| Units | Symbol | Si | Ge |
|---|---|---|---|
| Reference moisture | |||
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Alhashash, A.; Elidy, E.S.; El-Bary, A.A.; Tantawi, R.S.; Lotfy, K. Two-Temperature Semiconductor Model Photomechanical and Thermal Wave Responses with Moisture Diffusivity Process. Crystals 2022, 12, 1770. https://doi.org/10.3390/cryst12121770
Alhashash A, Elidy ES, El-Bary AA, Tantawi RS, Lotfy K. Two-Temperature Semiconductor Model Photomechanical and Thermal Wave Responses with Moisture Diffusivity Process. Crystals. 2022; 12(12):1770. https://doi.org/10.3390/cryst12121770
Chicago/Turabian StyleAlhashash, Abeer, E. S. Elidy, A. A. El-Bary, Ramdan S. Tantawi, and Khaled Lotfy. 2022. "Two-Temperature Semiconductor Model Photomechanical and Thermal Wave Responses with Moisture Diffusivity Process" Crystals 12, no. 12: 1770. https://doi.org/10.3390/cryst12121770
APA StyleAlhashash, A., Elidy, E. S., El-Bary, A. A., Tantawi, R. S., & Lotfy, K. (2022). Two-Temperature Semiconductor Model Photomechanical and Thermal Wave Responses with Moisture Diffusivity Process. Crystals, 12(12), 1770. https://doi.org/10.3390/cryst12121770

