Article Versions Notes

Lin P-T, Chang J-W, Chang S-R, Li Z-K, Chen W-Z, Huang J-H, Ji Y-Z, Hsueh W-J, Huang C-Y. A Stable and Efficient Pt/n-Type Ge Schottky Contact That Uses Low-Cost Carbon Paste Interlayers. Crystals. 2021; 11(3):259. https://doi.org/10.3390/cryst11030259

Lin, Pei-Te, Jia-Wei Chang, Syuan-Ruei Chang, Zhong-Kai Li, Wei-Zhi Chen, Jui-Hsuan Huang, Yu-Zhen Ji, Wen-Jeng Hsueh, and Chun-Ying Huang. 2021. "A Stable and Efficient Pt/n-Type Ge Schottky Contact That Uses Low-Cost Carbon Paste Interlayers" Crystals 11, no. 3: 259. https://doi.org/10.3390/cryst11030259

Lin, P.-T., Chang, J.-W., Chang, S.-R., Li, Z.-K., Chen, W.-Z., Huang, J.-H., Ji, Y.-Z., Hsueh, W.-J., & Huang, C.-Y. (2021). A Stable and Efficient Pt/n-Type Ge Schottky Contact That Uses Low-Cost Carbon Paste Interlayers. Crystals, 11(3), 259. https://doi.org/10.3390/cryst11030259