Chen, Z.; Tu, C.; Sun, H.; Kang, X.; Liu, J.; Hu, S.
Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic–Hippo Hybrid Algorithm. Micromachines 2025, 16, 1333.
https://doi.org/10.3390/mi16121333
AMA Style
Chen Z, Tu C, Sun H, Kang X, Liu J, Hu S.
Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic–Hippo Hybrid Algorithm. Micromachines. 2025; 16(12):1333.
https://doi.org/10.3390/mi16121333
Chicago/Turabian Style
Chen, Zhiyong, Chi Tu, Haifeng Sun, Xia Kang, Junbo Liu, and Song Hu.
2025. "Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic–Hippo Hybrid Algorithm" Micromachines 16, no. 12: 1333.
https://doi.org/10.3390/mi16121333
APA Style
Chen, Z., Tu, C., Sun, H., Kang, X., Liu, J., & Hu, S.
(2025). Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic–Hippo Hybrid Algorithm. Micromachines, 16(12), 1333.
https://doi.org/10.3390/mi16121333