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Micromachines 2014, 5(2), 325-340;

Wafer-Level Hybrid Integration of Complex Micro-Optical Modules

Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, D-07745 Jena, Germany
Author to whom correspondence should be addressed.
Received: 31 March 2014 / Revised: 21 May 2014 / Accepted: 27 May 2014 / Published: 5 June 2014
(This article belongs to the Special Issue Microlenses)
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A series of technological steps concentrating around photolithography and UV polymer on glass replication in a mask-aligner that allow for the cost-effective generation of rather complex micro-optical systems on the wafer level are discussed. In this approach, optical functional surfaces are aligned to each other and stacked on top of each other at a desired axial distance. They can consist of lenses, achromatic doublets, regular or chirped lens arrays, diffractive elements, apertures, filter structures, reflecting layers, polarizers, etc. The suitability of the separated modules in certain imaging and non-imaging applications will be shown. View Full-Text
Keywords: fabrication techniques; lithography; microlens; polymer; UV curing; hybrid integration fabrication techniques; lithography; microlens; polymer; UV curing; hybrid integration

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This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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Dannberg, P.; Wippermann, F.; Brückner, A.; Matthes, A.; Schreiber, P.; Bräuer, A. Wafer-Level Hybrid Integration of Complex Micro-Optical Modules. Micromachines 2014, 5, 325-340.

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