A Review on the Research Progress of Imprint Film Materials for Nanoimprint Lithography
Abstract
1. Introduction
2. Single-Material Nanoimprint Film
2.1. Research Progress on the Application of PDMS-Based Nanoimprint Film
2.2. Research Progress on PET-Based Nanoimprint Film
2.3. Research Progress on PVA-Based Nanoimprint Film
2.4. Comparative Overview of Single-Polymer Imprint Films
3. Polymer Composite Nanoimprint Film
3.1. Limitations of Single-Polymer Materials
3.2. Elastomer–Rigid Bilayer Composite Template
3.3. Sandwich Structure Composite Imprint Film
3.4. Theoretical Insights into Interface Reliability of Composite Imprint Films
3.5. Application Fields of Composite Imprint Film
3.6. Chapter Summary
4. Polymer/Transparent Electrode Composite System
4.1. Thermal Management
4.2. Electrostatic Control
4.3. Synergistic Advantages of Composite Structures
4.4. Application Fields of Composite Film
5. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
Abbreviations
| NIL | Nanoimprint lithography |
| PDMS | Polydimethylsiloxane |
| PET | Polyethylene terephthalate |
| PVA | Polyvinyl alcohol |
| AgNWs | Silver nanowires |
| R2R | Roll-to-roll |
| UV-NIL | Ultraviolet nanoimprint lithography |
| HSQ | Hydrogen silsesquioxane |
| RGB | Red, green, blue |
| SU-8 | Epoxy-based negative photoresist |
| LED | Light-emitting diode |
| T-NIL | Thermal nanoimprint lithography |
| RTR-UV-NIL | Roll-to-roll ultraviolet nanoimprint lithography |
| VOF | Volume of fluid |
| OC | Open channel |
| IS | Imprinting speed |
| OSC | Organic solar cell |
| R2P | Roll-to-plate |
| JSC | Short-circuit current density |
| FF | Fill factor |
| PCE | Power conversion efficiency |
| ITO | Indium tin oxide |
| PBDB-T | Poly[4,8-bis(5-(2-ethylhexyl)thiophen-2-yl)benzo[1,2-b:4,5-b′]dithiophene-2,6-diyl]-alt-(4-(2-ethylhexyl)-3-fluorothieno[3,4-b]thiophene-)-2-carboxylate-2-6-diyl] |
| ITIC | 3,9-bis(2-methylene-(3-(1,1-dicyanomethylene)-indanone))-5,5,11,11-tetrakis(4-hexylphenyl)-dithieno[2,3-d:2′,3′-d′]-s-indaceno[1,2-b:5,6-b′]dithiophene |
| LIPSS | Laser-induced periodic surface structure |
| PCL | Polycaprolactone |
| 3DPrANIL | 3D printing-assisted nanoimprint lithography |
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| Number of Imprints | SU-8 2002 Relative Hardness (Average, Range) | Reference Relative Hardness (Average, Range) |
|---|---|---|
| 10–20 | (1.1, 1.0–1.2) | (0.95, 0.8–1.1) |
| 20–40 | (0.9, 0.8–1.0) | (1.0, 0.9–1.1) |
| 40–60 | (1.4, 1.3–1.5) | (1.0, 0.8–1.2) |
| 60–80 | (0.95, 0.8–1.1) | (0.9, 0.5–1.6) |
| 80–100 | (1.1, 0.9–1.2) | (1.2, 1.0–1.3) |
| 100–120 | (1.1, 1.0–1.2) | (1.2, 1.1–1.3) |
| Designed Line Width (μm) | Mold Aspect Ratio | Simulation of PET Aspect Ratio | Experiment of PET Aspect Ratio |
|---|---|---|---|
| 0 | 2.30 | 0.35 | 0.65 |
| 80 | 1.30 | 0.35 | 0.60 |
| 120 | 0.85 | 0.35 | 0.58 |
| 160 | 0.75 | 0.38 | 0.68 |
| 200 | 0.55 | 0.38 | 0.52 |
| 240 | 0.48 | 0.35 | 0.42 |
| 280 | 0.40 | 0.32 | 0.38 |
| 320 | 0.35 | 0.28 | 0.33 |
| Material | Young’s Modulus | Transmittance | Curing Temperature | Max. Reported Resolution | Durability/Reusability | Other Features |
|---|---|---|---|---|---|---|
| PDMS | Low | >98% in visible range | room temperature | ~100 nm (direct etch with PS mask) | >100 imprints | Compliant conformal contact; Easy demolding; Deformation under external pressure |
| PET | High | >87% in visible range | ~80 °C | ~300 nm (RTR-UV-NIL) | Stable over 50 rolls in continuous RTR operation | Bendable but not stretchable; Relatively hard surface |
| PVA | High | >98% in visible range | room temperature | 100 nm (Au pattern, bilayer with HSQ); aspect ratio up to 5.8 (metalens) | Not reusable as a sacrificial mold | Water-soluble for stress-free demolding; Humidity-induced volume swelling ≈ 62.5 |
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© 2026 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license.
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Yang, Z.; Ma, R.; Yao, C.; Song, J.; Li, J.; Cui, G.; Li, H.; Cao, Y.; Ma, D. A Review on the Research Progress of Imprint Film Materials for Nanoimprint Lithography. Micromachines 2026, 17, 596. https://doi.org/10.3390/mi17050596
Yang Z, Ma R, Yao C, Song J, Li J, Cui G, Li H, Cao Y, Ma D. A Review on the Research Progress of Imprint Film Materials for Nanoimprint Lithography. Micromachines. 2026; 17(5):596. https://doi.org/10.3390/mi17050596
Chicago/Turabian StyleYang, Zhiwei, Rui Ma, Chuangye Yao, Jinsong Song, Jingrun Li, Guangxu Cui, Haiming Li, Yuanxun Cao, and Dayong Ma. 2026. "A Review on the Research Progress of Imprint Film Materials for Nanoimprint Lithography" Micromachines 17, no. 5: 596. https://doi.org/10.3390/mi17050596
APA StyleYang, Z., Ma, R., Yao, C., Song, J., Li, J., Cui, G., Li, H., Cao, Y., & Ma, D. (2026). A Review on the Research Progress of Imprint Film Materials for Nanoimprint Lithography. Micromachines, 17(5), 596. https://doi.org/10.3390/mi17050596

