Sun, H.; Zhang, Q.; Zhou, J.; Gong, J.; Jin, C.; Zhou, J.; Liu, J.
A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent. Micromachines 2025, 16, 798.
https://doi.org/10.3390/mi16070798
AMA Style
Sun H, Zhang Q, Zhou J, Gong J, Jin C, Zhou J, Liu J.
A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent. Micromachines. 2025; 16(7):798.
https://doi.org/10.3390/mi16070798
Chicago/Turabian Style
Sun, Haifeng, Qingyan Zhang, Jie Zhou, Jianwen Gong, Chuan Jin, Ji Zhou, and Junbo Liu.
2025. "A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent" Micromachines 16, no. 7: 798.
https://doi.org/10.3390/mi16070798
APA Style
Sun, H., Zhang, Q., Zhou, J., Gong, J., Jin, C., Zhou, J., & Liu, J.
(2025). A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent. Micromachines, 16(7), 798.
https://doi.org/10.3390/mi16070798
