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Journal: Micromachines, 2025
Volume: 16
Number: 710

Article: Influence of Homoepitaxial Layer Thickness on Flatness and Chemical Mechanical Planarization Induced Scratches of 4H-Silicon Carbide Epi-Wafers
Authors: by Chi-Hsiang Hsieh, Chiao-Yang Cheng, Yi-Kai Hsiao, Zi-Hao Wang, Chang-Ching Tu, Chao-Chang Arthur Chen, Po-Tsung Lee and Hao-Chung Kuo
Link: https://www.mdpi.com/2072-666X/16/6/710

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