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Journal: MicromachinesVolume: 16Number: 710
Article: Influence of Homoepitaxial Layer Thickness on Flatness and Chemical Mechanical Planarization Induced Scratches of 4H-Silicon Carbide Epi-Wafers
  • Authors:
  • Chi-Hsiang Hsieh1,
  • Chiao-Yang Cheng2 and
  • Yi-Kai Hsiao3
  • et al.
Link: https://www.mdpi.com/2072-666X/16/6/710

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