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Journal: Micromachines, 2025
Volume: 16
Number: 1333

Article: Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic–Hippo Hybrid Algorithm
Authors: by Zhiyong Chen, Chi Tu, Haifeng Sun, Xia Kang, Junbo Liu and Song Hu
Link: https://www.mdpi.com/2072-666X/16/12/1333

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