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Journal: Micromachines, 2024
Volume: 15
Number: 1122

Article: Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography
Authors: by Muhammad Waleed Hasan, Laura Deeb, Sergei Kumaniaev, Chenglu Wei and Kaiying Wang
Link: https://www.mdpi.com/2072-666X/15/9/1122

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