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A Study on the Resolution and Depth of Focus of ArF Immersion Photolithography
 
 

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Journal: Micromachines, 2022
Volume: 13
Number: 1982

Article: Pile-Ups Formation in AFM-Based Nanolithography: Morpho-Mechanical Characterization and Removal Strategies
Authors: by Paolo Pellegrino, Isabella Farella, Mariafrancesca Cascione, Valeria De Matteis, Alessandro Paolo Bramanti, Lorenzo Vincenti, Antonio Della Torre, Fabio Quaranta and Rosaria Rinaldi
Link: https://www.mdpi.com/2072-666X/13/11/1982

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