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Journal: Micromachines, 2021
Volume: 12
Number: 1316

Article: High Pressure Deuterium Passivation of Charge Trapping Layer for Nonvolatile Memory Applications
Authors: by Jae-Young Sung, Jun-Kyo Jeong, Woon-San Ko, Jun-Ho Byun, Hi-Deok Lee and Ga-Won Lee
Link: https://www.mdpi.com/2072-666X/12/11/1316

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