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Journal: Micromachines, 2020
Volume: 11
Number: 864

Article: Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching
Authors: by Zhitian Shi, Konstantins Jefimovs, Lucia Romano and Marco Stampanoni
Link: https://www.mdpi.com/2072-666X/11/9/864

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