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Editorial for the Special Issue on SiC Based Miniaturized Devices
Review

Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS

by 1,* and 2,*
1
Instituto de Ciência e Tecnologia (ICT), Universidade Federal de São Paulo (Unifesp), São José dos Campos SP 12231-280, Brazil
2
Laboratório de Plasmas e Processos (LPP), Instituto Tecnológico de Aeronáutica (ITA), São José dos Campos SP 12228-900, Brazil
*
Authors to whom correspondence should be addressed.
Micromachines 2020, 11(9), 799; https://doi.org/10.3390/mi11090799
Received: 2 August 2020 / Revised: 18 August 2020 / Accepted: 20 August 2020 / Published: 24 August 2020
(This article belongs to the Special Issue SiC Based Miniaturized Devices, Volume II)
A search of the recent literature reveals that there is a continuous growth of scientific publications on the development of chemical vapor deposition (CVD) processes for silicon carbide (SiC) films and their promising applications in micro- and nanoelectromechanical systems (MEMS/NEMS) devices. In recent years, considerable effort has been devoted to deposit high-quality SiC films on large areas enabling the low-cost fabrication methods of MEMS/NEMS sensors. The relatively high temperatures involved in CVD SiC growth are a drawback and studies have been made to develop low-temperature CVD processes. In this respect, atomic layer deposition (ALD), a modified CVD process promising for nanotechnology fabrication techniques, has attracted attention due to the deposition of thin films at low temperatures and additional benefits, such as excellent uniformity, conformability, good reproducibility, large area, and batch capability. This review article focuses on the recent advances in the strategies for the CVD of SiC films, with a special emphasis on low-temperature processes, as well as ALD. In addition, we summarize the applications of CVD SiC films in MEMS/NEMS devices and prospects for advancement of the CVD SiC technology. View Full-Text
Keywords: silicon carbide; chemical vapor deposition; atomic layer deposition; microelectromechanical systems; nanoelectromechanical systems silicon carbide; chemical vapor deposition; atomic layer deposition; microelectromechanical systems; nanoelectromechanical systems
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MDPI and ACS Style

Fraga, M.; Pessoa, R. Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS. Micromachines 2020, 11, 799. https://doi.org/10.3390/mi11090799

AMA Style

Fraga M, Pessoa R. Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS. Micromachines. 2020; 11(9):799. https://doi.org/10.3390/mi11090799

Chicago/Turabian Style

Fraga, Mariana, and Rodrigo Pessoa. 2020. "Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS" Micromachines 11, no. 9: 799. https://doi.org/10.3390/mi11090799

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