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Open AccessArticle

Rolling Nanoelectrode Lithography

1
Centre for Precision Manufacturing, DMEM, University of Strathclyde, Glasgow G1 1XJ, UK
2
Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116024, China
*
Authors to whom correspondence should be addressed.
Micromachines 2020, 11(7), 656; https://doi.org/10.3390/mi11070656
Received: 20 May 2020 / Revised: 25 June 2020 / Accepted: 29 June 2020 / Published: 30 June 2020
(This article belongs to the Special Issue Ultra Precision Technologies for Micromachining)
Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between the roller and the silicon specimen, so that the local oxidation process occurred uniformly over a large area of the specimen. In this work, a brass roller wrapped with a fabricated polycarbonate strip was used as a stamp to generate nanopatterns on a silicon surface. The experimental results show that a uniform pattern transfer for a large area can be achieved with this new rolling nanoelectrode lithography approach. The rolling speed and the applied bias voltage were identified as the primary control parameters for oxide growth. Furthermore, the pattern direction showed no significant influence on the oxide process. We therefore demonstrated that nanoelectrode lithography can be scaled up for large-area nanofabrication by incorporating a roller stamp. View Full-Text
Keywords: nanolithography; uniformity; pattern direction; rolling speed; bias voltage nanolithography; uniformity; pattern direction; rolling speed; bias voltage
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MDPI and ACS Style

Hasan, R.M.M.; Luo, X.; Sun, J. Rolling Nanoelectrode Lithography. Micromachines 2020, 11, 656.

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