Next Article in Journal
Study on Electrical Explosion Properties of Cu/Ni Multilayer Exploding Foil Prepared by Magnetron Sputtering and Electroplating
Previous Article in Journal
Development of a Portable SPR Sensor for Nucleic Acid Detection
Open AccessArticle

Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition

1
Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
2
School of Mechanical Engineering, Pusan National University, Busan 46241, Korea
3
Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USA
*
Author to whom correspondence should be addressed.
Micromachines 2020, 11(5), 527; https://doi.org/10.3390/mi11050527
Received: 16 April 2020 / Revised: 19 May 2020 / Accepted: 20 May 2020 / Published: 22 May 2020
(This article belongs to the Special Issue Nanofabrication with Focused Electron/Ion Beam Induced Processing)
The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques. View Full-Text
Keywords: helium ion microscopy; focused ion beam induced deposition; 3D nano-printing; direct-write nanofabrication helium ion microscopy; focused ion beam induced deposition; 3D nano-printing; direct-write nanofabrication
Show Figures

Graphical abstract

MDPI and ACS Style

Belianinov, A.; Burch, M.J.; Ievlev, A.; Kim, S.; Stanford, M.G.; Mahady, K.; Lewis, B.B.; Fowlkes, J.D.; Rack, P.D.; Ovchinnikova, O.S. Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition. Micromachines 2020, 11, 527.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

1
Search more from Scilit
 
Search
Back to TopTop