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Journal: Micromachines, 2019
Volume: 10
Number: 361
Article:
Characterization of Al Incorporation into HfO2 Dielectric by Atomic Layer Deposition
Authors:
by
Md. Mamunur Rahman, Jun-Gyu Kim, Dae-Hyun Kim and Tae-Woo Kim
Link:
https://www.mdpi.com/2072-666X/10/6/361
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