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Journal: Micromachines, 2019
Volume: 10
Number: 361

Article: Characterization of Al Incorporation into HfO2 Dielectric by Atomic Layer Deposition
Authors: by Md. Mamunur Rahman, Jun-Gyu Kim, Dae-Hyun Kim and Tae-Woo Kim
Link: https://www.mdpi.com/2072-666X/10/6/361

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