Product and Process Fingerprint for Nanosecond Pulsed Laser Ablated Superhydrophobic Surface
Abstract
:1. Introduction
2. Analysis of Process and Product Fingerprints
2.1. Analysis of Process Fingerprint Candidates: Laser Power, Exposure Time, Laser Pulse Energy Per Unit Area of Specimen
2.1.1. Laser Power (P)
2.1.2. Exposure Time (t)
2.2. Analysis of Product Fingerprint Candidates: Sa, Sz, Sku, Sdr, Sdq, Rhy
3. Experimental Details
4. Results and Discussion
4.1. Analysis of Product Fingerprint: Sa, Sz, Sku, Sdr, Sdq, Rhy
4.2. Analysis of Process Fingerprints: P, t and Is
4.3. Correlation Between Laser Machining Parameters and Contact Angle
5. Conclusions
Author Contributions
Acknowledgments
Conflicts of Interest
Data Statement
References
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Name | Symbol | Meaning |
---|---|---|
Arithmetical mean height | Sa | The difference in height of each point compared to the arithmetical mean of the surface. |
Maximum height | Sz | The sum of the largest peak height value and the largest pit depth value within the defined area. |
Kurtosis | Sku | A measure of the sharpness of the roughness profile. Sku < 3: Height distribution is skewed above the mean plane. Sku = 3: Height distribution is normal. (Sharp portions and indented portions co-exist.) Sku > 3: Height distribution is spiked. |
Developed interfacial area ratio | Sdr | The percentage of the definition area’s additional surface area contributed by the texture as compared to the planar definition area. |
Root mean square gradient | Sdq | Root mean square of slopes at all points in the definition area. When a surface has any slope, its Sdq value becomes larger. |
Average ratio of Rz to Rsm | Rhy | Average ratio of the maximum height of profile (Rz) and mean width of the profile elements (RSm) |
Pitch (μm) | Laser Power (W) | Pulse Repetition Rate | Feed Rate (mm/min) | Exposure Time (s) | Pattern Types |
---|---|---|---|---|---|
90 | 4,6,10,14,20 | 100K | 200 | 0.4 | Gaussian holes |
110 | 4,6,10,14,20 | 100K | 200 | 0.4 | Gaussian holes |
130 | 4,6,10,14,20 | 100K | 200 | 0.4 | Gaussian holes |
150 | 4,6,10,14,20 | 100K | 200 | 0.4 | Gaussian holes |
Pitch (μm) | Laser Power (W) | Pulse Repetition Rate | Feed Rate (mm/min) | Exposure Time (s) | Pattern Types |
---|---|---|---|---|---|
70 | 20 | 100K | 200 | 0.2,0.4,0.6,1 | Gaussian holes |
90 | 20 | 100K | 200 | 0.2,0.4,0.6,1 | Gaussian holes |
110 | 20 | 100K | 200 | 0.2,0.4,0.6,1 | Gaussian holes |
130 | 20 | 100K | 200 | 0.2,0.4,0.6,1 | Gaussian holes |
150 | 20 | 100K | 200 | 0.2,0.4,0.6,1 | Gaussian holes |
Value of Coefficient | Correlation Type |
---|---|
1 | Perfect correlation |
0.81–0.99 | Strong correlation |
0.71–0.80 | Good correlation |
0.51–0.70 | Weak correlation |
0.01–0.50 | Poor correlation |
0 | No correlation |
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Cai, Y.; Luo, X.; Liu, Z.; Qin, Y.; Chang, W.; Sun, Y. Product and Process Fingerprint for Nanosecond Pulsed Laser Ablated Superhydrophobic Surface. Micromachines 2019, 10, 177. https://doi.org/10.3390/mi10030177
Cai Y, Luo X, Liu Z, Qin Y, Chang W, Sun Y. Product and Process Fingerprint for Nanosecond Pulsed Laser Ablated Superhydrophobic Surface. Micromachines. 2019; 10(3):177. https://doi.org/10.3390/mi10030177
Chicago/Turabian StyleCai, Yukui, Xichun Luo, Zhanqiang Liu, Yi Qin, Wenlong Chang, and Yazhou Sun. 2019. "Product and Process Fingerprint for Nanosecond Pulsed Laser Ablated Superhydrophobic Surface" Micromachines 10, no. 3: 177. https://doi.org/10.3390/mi10030177
APA StyleCai, Y., Luo, X., Liu, Z., Qin, Y., Chang, W., & Sun, Y. (2019). Product and Process Fingerprint for Nanosecond Pulsed Laser Ablated Superhydrophobic Surface. Micromachines, 10(3), 177. https://doi.org/10.3390/mi10030177