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Journal: Micromachines, 2019
Volume: 10
Number: 136
Article:
Residual Stress in Lithium Niobate Film Layer of LNOI/Si Hybrid Wafer Fabricated Using Low-Temperature Bonding Method
Authors:
by
Ryo Takigawa, Toru Tomimatsu, Eiji Higurashi and Tanemasa Asano
Link:
https://www.mdpi.com/2072-666X/10/2/136
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