Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge
1
Institut für Physik, Ernst-Moritz-Arndt-Universität Greifswald, Felix-Hausdorff-Str. 6, Greifswald 17489, Germany
2
Faculty of Electronics, Telecommunications and Informatics, Gdansk University of Technology, 11/12 G. Narutowicza St., Gdansk 80-233, Poland
3
Institut für Chemie und Biochemie-Physikalische und Theoretische Chemie, Freie Universität Berlin, Takustr. 3, Berlin 14195, Germany
*
Author to whom correspondence should be addressed.
Academic Editor: Lanxia Cheng
Materials 2016, 9(7), 594; https://doi.org/10.3390/ma9070594
Received: 11 May 2016 / Revised: 4 July 2016 / Accepted: 6 July 2016 / Published: 19 July 2016
(This article belongs to the Special Issue Thin-Film Deposition, Characterization and Advanced Surface Engineering)
Abstract
Plasma polymerized a-C:H thin films have been deposited on Si (100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using C2Hm/Ar (m = 2, 4, 6) gas mixtures. The deposited films were characterized by Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS), Raman spectroscopy, and ellipsometry. FT-IRRAS revealed the presence of sp3 and sp2 C–H stretching and C–H bending vibrations of bonds in the films. The presence of D and G bands was confirmed by Raman spectroscopy. Thin films obtained from C2H4/Ar and C2H6/Ar gas mixtures have ID/IG ratios of 0.45 and 0.3, respectively. The refractive indices were 2.8 and 3.1 for C2H4/Ar and C2H6/Ar films, respectively, at a photon energy of 2 eV. View Full-TextKeywords:
dielectric barrier discharge (DBD); thin film deposition; a-C:H films; atmospheric pressure; hydrocarbon plasma
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Chandrashekaraiah, T.H.; Bogdanowicz, R.; Rühl, E.; Danilov, V.; Meichsner, J.; Thierbach, S.; Hippler, R. Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge. Materials 2016, 9, 594.
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