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Journal: Materials, 2012
Volume: 5
Number: 377
Article:
A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based α-SiCN:H/α-SiCO:H Diffusion Barrier Films
Authors:
by
Sheng-Wen Chen, Yu-Sheng Wang, Shao-Yu Hu, Wen-Hsi Lee, Chieh-Cheng Chi and Ying-Lang Wang
Link:
https://www.mdpi.com/1996-1944/5/3/377
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