Wich, M.; Helmerich, J.; Ott, P.; Ambacher, O.; Rupitsch, S.J.
Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing. Materials 2026, 19, 1782.
https://doi.org/10.3390/ma19091782
AMA Style
Wich M, Helmerich J, Ott P, Ambacher O, Rupitsch SJ.
Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing. Materials. 2026; 19(9):1782.
https://doi.org/10.3390/ma19091782
Chicago/Turabian Style
Wich, Manfred, Jan Helmerich, Philipp Ott, Oliver Ambacher, and Stefan Johann Rupitsch.
2026. "Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing" Materials 19, no. 9: 1782.
https://doi.org/10.3390/ma19091782
APA Style
Wich, M., Helmerich, J., Ott, P., Ambacher, O., & Rupitsch, S. J.
(2026). Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing. Materials, 19(9), 1782.
https://doi.org/10.3390/ma19091782