Molecular Dynamics Investigation of CSH/SiO2 Interface Degradation in High-Temperature and Water-Rich Environments
Abstract
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Zhang, L.; Hu, Y.; Zhang, Q.; Huang, C.; Zou, L.; Li, Z.; Wang, R.; Feng, C.; Li, M.; Yang, Z. Molecular Dynamics Investigation of CSH/SiO2 Interface Degradation in High-Temperature and Water-Rich Environments. Materials 2026, 19, 2295. https://doi.org/10.3390/ma19112295
Zhang L, Hu Y, Zhang Q, Huang C, Zou L, Li Z, Wang R, Feng C, Li M, Yang Z. Molecular Dynamics Investigation of CSH/SiO2 Interface Degradation in High-Temperature and Water-Rich Environments. Materials. 2026; 19(11):2295. https://doi.org/10.3390/ma19112295
Chicago/Turabian StyleZhang, Lianzhen, Yiwei Hu, Qingsong Zhang, Changxin Huang, Liangchao Zou, Zhipeng Li, Runan Wang, Congjian Feng, Mingchen Li, and Zongjian Yang. 2026. "Molecular Dynamics Investigation of CSH/SiO2 Interface Degradation in High-Temperature and Water-Rich Environments" Materials 19, no. 11: 2295. https://doi.org/10.3390/ma19112295
APA StyleZhang, L., Hu, Y., Zhang, Q., Huang, C., Zou, L., Li, Z., Wang, R., Feng, C., Li, M., & Yang, Z. (2026). Molecular Dynamics Investigation of CSH/SiO2 Interface Degradation in High-Temperature and Water-Rich Environments. Materials, 19(11), 2295. https://doi.org/10.3390/ma19112295

