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Journal: Materials, 2025
Volume: 18
Number: 1740
Article:
Super High-k Dielectric via Composition-Dependent Hafnium Zirconium Oxide Superlattice for Si Nanosheet Gate-All-Around Field-Effect Transistors with NH3 Plasma-Optimized Interfaces
Authors:
by
Yi-Ju Yao, Yu-Min Fu, Yu-Hung Chen, Chen-You Wei, Kai-Ting Huang, Guang-Li Luo, Fu-Ju Hou, Yu-Sheng Lai and Yung-Chun Wu
Link:
https://www.mdpi.com/1996-1944/18/8/1740
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