Zhao, L.; Wang, X.; Jiang, M.; Zhao, C.; Jiang, N.; Nishimura, K.; Yi, J.; Fang, S.
Optimization of Diamond Polishing Process for Sub-Nanometer Roughness Using Ar/O2/SF6 Plasma. Materials 2025, 18, 2615.
https://doi.org/10.3390/ma18112615
AMA Style
Zhao L, Wang X, Jiang M, Zhao C, Jiang N, Nishimura K, Yi J, Fang S.
Optimization of Diamond Polishing Process for Sub-Nanometer Roughness Using Ar/O2/SF6 Plasma. Materials. 2025; 18(11):2615.
https://doi.org/10.3390/ma18112615
Chicago/Turabian Style
Zhao, Lei, Xiangbing Wang, Minxing Jiang, Chao Zhao, Nan Jiang, Kazhihito Nishimura, Jian Yi, and Shuangquan Fang.
2025. "Optimization of Diamond Polishing Process for Sub-Nanometer Roughness Using Ar/O2/SF6 Plasma" Materials 18, no. 11: 2615.
https://doi.org/10.3390/ma18112615
APA Style
Zhao, L., Wang, X., Jiang, M., Zhao, C., Jiang, N., Nishimura, K., Yi, J., & Fang, S.
(2025). Optimization of Diamond Polishing Process for Sub-Nanometer Roughness Using Ar/O2/SF6 Plasma. Materials, 18(11), 2615.
https://doi.org/10.3390/ma18112615
