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Journal: Materials, 2024
Volume: 17
Number: 2448

Article: Cluster-Assisted Mesoplasma Chemical Vapor Deposition for Fast Epitaxial Growth of SiGe/Si Heterostructures: A Molecular Dynamics Simulation Study
Authors: by Wen-bo Wang, Wenfang Li, Ryoshi Ohta and Makoto Kambara
Link: https://www.mdpi.com/1996-1944/17/10/2448

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