Jiang, W.; Zhu, L.; Chen, L.; Yang, Y.; Yu, X.; Li, X.; Mu, Z.; Yu, W.
In Situ Synchrotron XRD Characterization of Piezoelectric Al1−xScxN Thin Films for MEMS Applications. Materials 2023, 16, 1781.
https://doi.org/10.3390/ma16051781
AMA Style
Jiang W, Zhu L, Chen L, Yang Y, Yu X, Li X, Mu Z, Yu W.
In Situ Synchrotron XRD Characterization of Piezoelectric Al1−xScxN Thin Films for MEMS Applications. Materials. 2023; 16(5):1781.
https://doi.org/10.3390/ma16051781
Chicago/Turabian Style
Jiang, Wenzheng, Lei Zhu, Lingli Chen, Yumeng Yang, Xi Yu, Xiaolong Li, Zhiqiang Mu, and Wenjie Yu.
2023. "In Situ Synchrotron XRD Characterization of Piezoelectric Al1−xScxN Thin Films for MEMS Applications" Materials 16, no. 5: 1781.
https://doi.org/10.3390/ma16051781
APA Style
Jiang, W., Zhu, L., Chen, L., Yang, Y., Yu, X., Li, X., Mu, Z., & Yu, W.
(2023). In Situ Synchrotron XRD Characterization of Piezoelectric Al1−xScxN Thin Films for MEMS Applications. Materials, 16(5), 1781.
https://doi.org/10.3390/ma16051781