Gutiérrez, D.R.; GarcÃa-Salgado, G.; Coyopol, A.; Rosendo-Andrés, E.; Romano, R.; Morales, C.; BenÃtez, A.; Severiano, F.; Herrera, A.M.; RamÃrez-González, F.
Effect of the Deposit Temperature of ZnO Doped with Ni by HFCVD. Materials 2023, 16, 1526.
https://doi.org/10.3390/ma16041526
AMA Style
Gutiérrez DR, GarcÃa-Salgado G, Coyopol A, Rosendo-Andrés E, Romano R, Morales C, BenÃtez A, Severiano F, Herrera AM, RamÃrez-González F.
Effect of the Deposit Temperature of ZnO Doped with Ni by HFCVD. Materials. 2023; 16(4):1526.
https://doi.org/10.3390/ma16041526
Chicago/Turabian Style
Gutiérrez, Delfino R., Godofredo GarcÃa-Salgado, Antonio Coyopol, Enrique Rosendo-Andrés, Román Romano, Crisóforo Morales, Alfredo BenÃtez, Francisco Severiano, Ana MarÃa Herrera, and Francisco RamÃrez-González.
2023. "Effect of the Deposit Temperature of ZnO Doped with Ni by HFCVD" Materials 16, no. 4: 1526.
https://doi.org/10.3390/ma16041526
APA Style
Gutiérrez, D. R., GarcÃa-Salgado, G., Coyopol, A., Rosendo-Andrés, E., Romano, R., Morales, C., BenÃtez, A., Severiano, F., Herrera, A. M., & RamÃrez-González, F.
(2023). Effect of the Deposit Temperature of ZnO Doped with Ni by HFCVD. Materials, 16(4), 1526.
https://doi.org/10.3390/ma16041526
