Xia, X.; Chiang, C.-C.; Gopalakrishnan, S.K.; Kulkarni, A.V.; Ren, F.; Ziegler, K.J.; Esquivel-Upshaw, J.F.
Properties of SiCN Films Relevant to Dental Implant Applications. Materials 2023, 16, 5318.
https://doi.org/10.3390/ma16155318
AMA Style
Xia X, Chiang C-C, Gopalakrishnan SK, Kulkarni AV, Ren F, Ziegler KJ, Esquivel-Upshaw JF.
Properties of SiCN Films Relevant to Dental Implant Applications. Materials. 2023; 16(15):5318.
https://doi.org/10.3390/ma16155318
Chicago/Turabian Style
Xia, Xinyi, Chao-Ching Chiang, Sarathy K. Gopalakrishnan, Aniruddha V. Kulkarni, Fan Ren, Kirk J. Ziegler, and Josephine F. Esquivel-Upshaw.
2023. "Properties of SiCN Films Relevant to Dental Implant Applications" Materials 16, no. 15: 5318.
https://doi.org/10.3390/ma16155318
APA Style
Xia, X., Chiang, C.-C., Gopalakrishnan, S. K., Kulkarni, A. V., Ren, F., Ziegler, K. J., & Esquivel-Upshaw, J. F.
(2023). Properties of SiCN Films Relevant to Dental Implant Applications. Materials, 16(15), 5318.
https://doi.org/10.3390/ma16155318