Wang, Y.; Li, X.; Yan, X.; Dou, S.; Li, Y.; Wang, L.
Effects of Film Thickness on the Residual Stress of Vanadium Dioxide Thin Films Grown by Magnetron Sputtering. Materials 2023, 16, 5093.
https://doi.org/10.3390/ma16145093
AMA Style
Wang Y, Li X, Yan X, Dou S, Li Y, Wang L.
Effects of Film Thickness on the Residual Stress of Vanadium Dioxide Thin Films Grown by Magnetron Sputtering. Materials. 2023; 16(14):5093.
https://doi.org/10.3390/ma16145093
Chicago/Turabian Style
Wang, Yuemin, Xingang Li, Xiangqiao Yan, Shuliang Dou, Yao Li, and Lei Wang.
2023. "Effects of Film Thickness on the Residual Stress of Vanadium Dioxide Thin Films Grown by Magnetron Sputtering" Materials 16, no. 14: 5093.
https://doi.org/10.3390/ma16145093
APA Style
Wang, Y., Li, X., Yan, X., Dou, S., Li, Y., & Wang, L.
(2023). Effects of Film Thickness on the Residual Stress of Vanadium Dioxide Thin Films Grown by Magnetron Sputtering. Materials, 16(14), 5093.
https://doi.org/10.3390/ma16145093